Unravelling the essential difference between TiO and AlO interface layers on Ta3N5 photoanode for photoelectrochemical water oxidation
Yongle Zhao, Huichen Xie, Wenwen Shi, Hong Wang, Chenyi Shao, Can Li
Topics & Concepts
PassivationPhotocurrentTantalum nitrideWater splittingMaterials scienceLayer (electronics)PhotoelectrochemistryElectrodeTantalumNitrideBand gapChemical engineeringOptoelectronicsReversible hydrogen electrodeNanotechnologyChemistryPhotocatalysisCatalysisElectrochemistryWorking electrodeMetallurgyPhysical chemistryBiochemistryEngineeringAdvanced Photocatalysis TechniquesElectronic and Structural Properties of OxidesMXene and MAX Phase Materials