Structural insight into an atomic layer deposition (ALD) grown Al <sub>2</sub> O <sub>3</sub> layer on Ni/SiO <sub>2</sub> : impact on catalytic activity and stability in dry reforming of methane
Sung Min Kim, Andaç Armutlulu, Wei‐Chih Liao, Davood Hosseini, Dragos Stoian, Zixuan Chen, Paula M. Abdala, Christophe Copéret, Christoph R. Müller
Abstract
Improving the stability of Ni-based dry reforming catalysts is a key challenge. ALD-grown Al 2 O 3 overcoats deposited onto Ni/SiO 2 prevent the sintering of Ni, reduce deactivation by coke and inhibit the formation of inactive NiAl 2 O 4 on time on stream.
Topics & Concepts
Atomic layer depositionCatalysisLayer (electronics)Deposition (geology)Chemical engineeringMaterials scienceNanotechnologyChemistryGeologyOrganic chemistryEngineeringSedimentPaleontologyCatalytic Processes in Materials ScienceCatalysts for Methane ReformingCatalysis and Oxidation Reactions