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Growth and characterization of Si-doped Ga2O3 thin films by remote plasma atomic layer deposition: Toward UVC-LED application

Xiaoying Zhang, Yue Yang, Wei‐Hang Fan, Chen Wang, Wan-Yu Wu, Ming-Chun Tseng, Dong‐Sing Wuu, Peng Gao, Hao‐Chung Kuo, Shui‐Yang Lien, Wen‐Zhang Zhu

2022Surface and Coatings Technology36 citationsDOI

Topics & Concepts

Thin filmMaterials scienceX-ray photoelectron spectroscopyDopingAnalytical Chemistry (journal)EllipsometryTrimethylgalliumAnnealing (glass)Carbon filmElectrical resistivity and conductivitySiliconLayer (electronics)OptoelectronicsNanotechnologyMetalorganic vapour phase epitaxyComposite materialChemical engineeringEpitaxyChemistryElectrical engineeringChromatographyEngineeringGa2O3 and related materialsZnO doping and propertiesAdvanced Photocatalysis Techniques
Growth and characterization of Si-doped Ga2O3 thin films by remote plasma atomic layer deposition: Toward UVC-LED application | Litcius