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Schottky barrier engineering with a metal nitride–double interlayer–semiconductor contact structure to achieve high thermal stability and ultralow contact resistivity

Euyjin Park, Seung‐Hwan Kim, Hyun‐Yong Yu

2020Applied Surface Science11 citationsDOI

Topics & Concepts

Materials scienceDiffusion barrierSemiconductorSchottky barrierContact resistanceElectrical resistivity and conductivityThermal stabilityNitrideAnnealing (glass)Composite materialOptoelectronicsLayer (electronics)Chemical engineeringElectrical engineeringDiodeEngineeringSemiconductor materials and devicesSemiconductor materials and interfacesMetal and Thin Film Mechanics
Schottky barrier engineering with a metal nitride–double interlayer–semiconductor contact structure to achieve high thermal stability and ultralow contact resistivity | Litcius