Large-Area Growth of High-Optical-Quality MoSe<sub>2</sub>/hBN Heterostructures with Tunable Charge Carrier Concentration
Katarzyna Ludwiczak, Aleksandra K. Dąbrowska, Julia Kucharek, Jakub Rogoża, Mateusz Tokarczyk, R. Bożek, Marta Gryglas-Borysiewicz, Takashi Taniguchi, Kenji Watanabe, Johannes Binder, W. Pacuski, A. Wysmołek
Abstract
High Resolution Image Download MS PowerPoint Slide Van der Waals heterostructures open up vast possibilities for applications in optoelectronics, especially since it was recognized that the optical properties of transition-metal dichalcogenides (TMDC) can be enhanced by adjacent hBN layers. However, although many micrometer-sized structures have been fabricated, the bottleneck for applications remains the lack of large-area structures with electrically tunable photoluminescence emission. In this study, we demonstrate the electrical charge carrier tuning for large-area epitaxial MoSe 2 grown directly on epitaxial hBN. The structure is produced in a multistep procedure involving Metalorganic Vapor Phase Epitaxy (MOVPE) growth of large-area hBN, a wet transfer of hBN onto a SiO 2 /Si substrate, and the subsequent Molecular Beam Epitaxy (MBE) growth of monolayer MoSe 2 . The electrically induced change of the carrier concentration is deduced from the evolution of well-resolved charged and neutral exciton intensities. Our findings show that it is feasible to grow large-area, electrically addressable, high-optical-quality van der Waals heterostructures.