Highly efficient and atomic scale polishing of GaN via plasma-based atom-selective etching
Linfeng Zhang, Bing Wu, Yi Zhang, Hui Deng
Topics & Concepts
Etching (microfabrication)Inductively coupled plasmaChemical-mechanical planarizationPolishingPlasmaMaterials sciencePlasma etchingVolumetric flow rateReactive-ion etchingSurface roughnessAnalytical Chemistry (journal)ChemistryLayer (electronics)NanotechnologyMetallurgyComposite materialPhysicsChromatographyQuantum mechanicsPlasma Diagnostics and ApplicationsMetal and Thin Film MechanicsSemiconductor materials and devices