Zeta potential-tunable silica abrasives and fluorinated surfactants in chemical mechanical polishing slurries
Seung-Chul Hong, Deoksu Han, Keon‐Soo Jang
Topics & Concepts
Chemical-mechanical planarizationMaterials scienceWaferSlurryZeta potentialPolishingAbrasion (mechanical)Colloidal silicaNanotechnologyFabricationSurface roughnessChemical engineeringComposite materialNanoparticleCoatingMedicineEngineeringPathologyAlternative medicineAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchForce Microscopy Techniques and Applications