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Influence of Vertical Facial Growth Pattern on Herbst Appliance Effects in Prepubertal Patients: A Retrospective Controlled Study

Maria Rita Giuca, Marco Pasini, Sara Drago, Leonardo Del Corso, A Vanni, Elisabetta Carli, Antonio Manni

2020International Journal of Dentistry21 citationsDOIOpen Access PDF

Abstract

INTRODUCTION: The Herbst device is widely used for correction of class II malocclusions; however, most of the researches carried out on the Herbst appliance in literature do not take into account patients with a different mandibular divergence. The aim of this study was to investigate the effects of Herbst on dental and skeletal structures and to evaluate possible influence of vertical facial growth patterns. METHODS: A retrospective study was conducted on lateral cephalograms of 75 growing patients (mean age: 9.9 ± 1.9 years) with class II malocclusion treated with Herbst. Subjects were divided into 3 groups using the mandibular divergence index (SN and GoMe angle). Cephalometric parameters were evaluated using the modified SO (sagittal occlusion) Pancherz's analysis. A statistical analysis was conducted to evaluate differences among groups using ANOVA. RESULTS: < 0.05) between hypodivergent patients and normodivergent patients and between hypodivergent and hyperdivergent subjects. CONCLUSION: Hypodivergent patients increased their mandibular divergence during treatment to a greater extent than normodivergents; moreover, hyperdivergent patients exhibited a decreased mandibular divergence at the end of the treatment.

Topics & Concepts

MedicineDentistryMalocclusionSagittal planeOcclusionOrthodonticsMandible (arthropod mouthpart)Statistical significanceStatistical analysisRetrospective cohort studySurgeryInternal medicineAnatomyMathematicsGenusBotanyStatisticsBiologyOrthodontics and Dentofacial OrthopedicsFacial Rejuvenation and Surgery TechniquesTemporomandibular Joint Disorders
Influence of Vertical Facial Growth Pattern on Herbst Appliance Effects in Prepubertal Patients: A Retrospective Controlled Study | Litcius