Perspective: Atomic Layer Deposition Strategies for Surface Passivation of Metal-Halide Perovskite Absorbers
George Kwesi Asare, Jimi Adu, Byungha Shin, David J. Fermı́n, Helen Hejin Park
Abstract
Abstract Recent advancements have been made in perovskite solar cells (PSCs) using atomic layer deposition (ALD) of aluminum oxide (Al 2 O 3 ) and other suitable metal oxides such as zirconium oxide (ZrO 2 ) as a perovskite surface passivation technique. ALD has demonstrated significant potential for enhancing photovoltaic (PV) performance and the long-term light, thermal, humidity, and ultraviolet (UV) stability of PSCs by addressing surface defects leading to higher charge extraction and mitigating environmental degradation with only a few nanometers of thickness. However, direct ALD deposition on perovskite films can sometimes degrade the perovskite film from ALD precursor reactivity, elevated temperatures, and vacuum-induced instabilities. This perspective discusses recent strategies, challenges, and future directions for surface passivation of the perovskite solar absorber using ALD to improve device performance and long-term stability for commercialization of PSCs.