Experimental validation and molecular dynamics simulation of removal of PO residue on Co surface by alkaline cleaning solution with different functional groups
Xiaoqin Sun, Shihao Zhang, Mengrui Liu, Baimei Tan, Yangang He, Da Yin, Pengcheng Gao, Yazhen Wang
Topics & Concepts
X-ray photoelectron spectroscopyCobaltChemistryTetramethylammonium hydroxideEthylenediamineCleaning agentElectrochemistryChelationInorganic chemistryContact angleChemical engineeringOrganic chemistryPhysical chemistryElectrodeEngineeringAdvanced Surface Polishing TechniquesSemiconductor materials and devicesIntegrated Circuits and Semiconductor Failure Analysis