Surface chemical reactions of etch stop prevention in plasma-enhanced atomic layer etching of silicon nitride
Jomar U. Tercero, Akiko Hirata, Michiro Isobe, Kazuhiro Karahashi, Masanaga Fukasawa, Satoshi Hamaguchi
Topics & Concepts
Materials scienceIrradiationDesorptionEtching (microfabrication)Silicon nitrideIonPlasma etchingSiliconAdsorptionOxygenNitridePlasmaLayer (electronics)Analytical Chemistry (journal)Chemical engineeringNanotechnologyPhysical chemistryChemistryOptoelectronicsOrganic chemistryEngineeringQuantum mechanicsNuclear physicsPhysicsSemiconductor materials and devicesPlasma Diagnostics and ApplicationsZnO doping and properties