Etched characteristics of nanoscale TiO2 using C4F8-based and BCl3-based gases
Jong Woo Hong, Yeon Hee Kim, Hee‐Ju Kim, Hyun Woo Tak, Soo Nam Goong, Seong Bae Kim, Ki Deok Bae, Jeong Yub Lee, Hae Soo Bae, Geun Young Yeom, Dong Woo Kim, Hae Soo Bae, Geun Young Yeom, Dong Woo Kim
Topics & Concepts
Materials scienceEtching (microfabrication)SelectivityPlasmaReactive-ion etchingAnalytical Chemistry (journal)Plasma etchingSputteringDry etchingOptoelectronicsHalogenNanotechnologyThin filmChemistryCatalysisBiochemistryOrganic chemistryAlkylChromatographyLayer (electronics)PhysicsQuantum mechanicsSemiconductor materials and devicesZnO doping and propertiesPlasma Diagnostics and Applications