Influence of trap carriers in SiO2/HfO2 stacked dielectric cylindrical gate tunnel fet
I. Vivek Anand, T. S. Arun Samuel, V. N. Ramakrishnan, K. Ram Kumar
Topics & Concepts
Materials scienceCurrent (fluid)DielectricElectric fieldTrap (plumbing)Tunnel field-effect transistorWork (physics)Poisson's equationBoundary value problemDepletion regionOptoelectronicsChannel (broadcasting)MechanicsField-effect transistorElectrical engineeringVoltageThermodynamicsTransistorMathematical analysisPhysicsEngineeringSemiconductorMathematicsQuantum mechanicsMeteorologyAdvancements in Semiconductor Devices and Circuit DesignSemiconductor materials and devicesSilicon Carbide Semiconductor Technologies