Inherent selective pulsed chemical vapor deposition of aluminum oxide in nm scale
Yunil Cho, James Huang, Zichen Zhang, Kesong Wang, Ping‐Che Lee, Chanyoung Kim, Keith T. Wong, Srinivas Nemani, Ellie Yieh, Andrew C. Kummel
Topics & Concepts
Materials scienceOxideChemical vapor depositionAluminiumSelectivityFabricationChemical engineeringAnalytical Chemistry (journal)NanotechnologyInorganic chemistryMetallurgyChemistryOrganic chemistryCatalysisPathologyMedicineAlternative medicineEngineeringSemiconductor materials and devicesCopper Interconnects and ReliabilityMetal and Thin Film Mechanics