Effect of Electrode Material on the Polarization Switching Kinetics of Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Film
Dong Hyun Lee, Geun Hyeong Park, Se Hyun Kim, Kun Yang, Jaewook Lee, Hyojun Choi, Young H. Lee, Jin Ju Ryu, Je In Lee, Gun Hwan Kim, Min Hyuk Park
Abstract
Electrode materials can significantly impact the chemical and physical properties and polarization switching kinetics of ferroelectric Hf0.5Zr0.5O2 (HZO) films deposited through atomic layer deposition. In this study, the effect of various electrode materials (TiN, Mo, and W) on the microstructure and polarization switching properties of HZO films is investigated. The nucleation-limited switching model indicates that the Mo electrode is beneficial in the case of small device-to-device variation, whereas W and TiN electrodes are advantageous for accomplishing high-speed operations.
Topics & Concepts
TinElectrodeMaterials scienceNucleationPolarization (electrochemistry)MicrostructureFerroelectricityAtomic layer depositionKineticsAnalytical Chemistry (journal)OptoelectronicsLayer (electronics)Composite materialMetallurgyDielectricChemistryPhysical chemistryOrganic chemistryQuantum mechanicsPhysicsChromatographyFerroelectric and Negative Capacitance DevicesAdvanced Memory and Neural ComputingSemiconductor materials and devices