Influence of high energy ion irradiation on structural, morphological and optical properties of high-k dielectric hafnium oxide (HfO2) thin films grown by atomic layer deposition
Rajesh Kumar, Vishnu Chauhan, Nikhil Koratkar, Shalendra Kumar, Aditya Sharma, Keun Hwa Chae, Sung Ok Won
Topics & Concepts
Materials scienceThin filmAnalytical Chemistry (journal)IrradiationNanocrystalline materialFluenceX-ray photoelectron spectroscopyPhotoluminescenceAtomic layer depositionOptoelectronicsNanotechnologyChemistryNuclear magnetic resonancePhysicsChromatographyNuclear physicsSemiconductor materials and devicesElectronic and Structural Properties of OxidesFerroelectric and Negative Capacitance Devices