Litcius/Paper detail

Formation of SiO2 thin films through plasma- enhanced chemical vapor deposition using SiH4/Ar/N2O

Jingjing Zhang, Jingquan Guo, Qiutong Zhao, Lihui Yu, Shujun Ye, Hongxing Yin, Yeliang Wang

2024Thin Solid Films20 citationsDOI

Topics & Concepts

Chemical vapor depositionThin filmCombustion chemical vapor depositionPlasma-enhanced chemical vapor depositionCarbon filmPlasmaDeposition (geology)Plasma processingMaterials scienceChemical engineeringAnalytical Chemistry (journal)ChemistryNanotechnologyEnvironmental chemistryGeologyPhysicsPaleontologyQuantum mechanicsEngineeringSedimentSemiconductor materials and devicesThin-Film Transistor TechnologiesZnO doping and properties
Formation of SiO2 thin films through plasma- enhanced chemical vapor deposition using SiH4/Ar/N2O | Litcius