Progress in fabrication techniques and applications of patterned low-dimensional materials and nano-films
Yooseok Kim, Irma Kuljanishvili
Abstract
Abstract The field of thin films and low-dimensional materials encompassing graphene, transition metal dichalcogenides (TMDs), carbon nanotubes (CNTs), and hexagonal boron nitride (h-BN) has witnessed rapid advancements owing to their remarkable electronic, optical, and mechanical properties. When precisely structured and patterned, these materials enable transformative applications in nanoelectronics, photonics, energy storage, flexible electronics, and biomedical devices. This review comprehensively examines recent research progress in top-down and bottom-up patterning methodologies, hybrid approaches, and printing technologies for thin-film and two-dimensional materials. Key fabrication techniques such as electron beam lithography (EBL) and focused ion beam milling (FIB), chemical vapor deposition (CVD), nanoimprint lithography (NIL), and inkjet printing are discussed in the context of their fundamental principles, scalability, and potential applications. We also explore emerging hybrid strategies that integrate these techniques to address critical challenges, including material defects, scalability limitations, and alignment accuracy, thereby enabling the design of complex and hierarchical structures. Current and prospective potential applications, ranging from nanoelectronics and optoelectronics to energy storage, flexible wearables, and environmental sensing, are highlighted. Despite significant advances made in this area, challenges related to large-scale fabrication, material stability, and process integration persist. By delineating these challenges and possible solutions, this review aims to guide future research towards the realization of a fuller potential of patterned thin-film and low-dimensional materials in next-generation device technologies.