A Route to MoO2 film fabrication via atomic layer deposition using Mo(IV) precursor and oxygen reactant for DRAM applications
Ara Yoon, Hae Lin Yang, Sanghoon Lee, Seung-Hwan Lee, Beomseok Kim, Changhwa Jung, Hanjin Lim, Jin‐Seong Park
Topics & Concepts
Materials scienceMonoclinic crystal systemMolybdenumAnnealing (glass)Atomic layer depositionChemical engineeringOxideForming gasNanotechnologyThin filmCrystal structureCrystallographyMetallurgyChemistryEngineeringSemiconductor materials and devicesAdvanced Memory and Neural ComputingFerroelectric and Negative Capacitance Devices