Size distribution monitoring for chemical mechanical polishing slurries: An intercomparison of electron microscopy, dynamic light scattering, and differential mobility analysis
Jihyeon Lee, Siqin He, Guanyu Song, Christopher J. Hogan
Topics & Concepts
Dynamic light scatteringChemical-mechanical planarizationSlurryPolishingWaferMaterials scienceParticle-size distributionParticle sizeParticle (ecology)Scanning electron microscopeDifferential mobility analyzerAnalytical Chemistry (journal)NanoparticleComposite materialChemistryNanotechnologyChromatographyOceanographyPhysical chemistryGeologyMinerals Flotation and Separation TechniquesAdvanced Surface Polishing TechniquesCoagulation and Flocculation Studies