Atomic-scale study on particle movement mechanism during silicon substrate cleaning using ReaxFF MD

Qinyang Zeng, Changkun Li, Dewen Zhao, Xinchun Lu

2022Computational Materials Science13 citationsDOI

Topics & Concepts

ReaxFFWaferSubstrate (aquarium)SiliconMaterials scienceNanoparticleChemical-mechanical planarizationChemical engineeringParticle (ecology)Molecular dynamicsNanotechnologyChemistryPolishingComposite materialMetallurgyComputational chemistryInteratomic potentialEngineeringGeologyOceanographyAdvanced Surface Polishing TechniquesSemiconductor materials and devicesDiamond and Carbon-based Materials Research