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Performance Evaluation of High-κ Dielectric Ferro-Spacer Engineered Si/SiGe Hetero-Junction Line TFETs: A TCAD Approach

Sourabh Panwar, Shobhit Srivastava, M. Shashidhara, Abhishek Acharya

2023IEEE Transactions on Dielectrics and Electrical Insulation18 citationsDOI

Abstract

In this work, we have investigated the impact of ferroelectricity of high- <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\kappa $ </tex-math></inline-formula> spacers on the electrical performance of line-tunnel field-effect transistors (L-TFETs) by numerical simulation using technology computer-aided design (TCAD). We observed that the ferroelectric (FE) spacer increases the fringing electric field near the tunneling cross Section at the source–epitaxial layer junction. This, in turn, increases the band-to-band tunneling (BTBT) generation and hence the drive capability of the device. Almost <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$2\times $ </tex-math></inline-formula> improvement in the drive capability of L-TFET is observed when the saturation ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\left(P_s\right)$ </tex-math></inline-formula> ) and remanent polarization ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\left(P_r\right)$ </tex-math></inline-formula> ) of spacer material are kept at 60 and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$3 \mu \text{C}$ </tex-math></inline-formula> /cm <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$^{\textbf {2}}$ </tex-math></inline-formula> , respectively, without any significant change in the OFF current. A change of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\sim $ </tex-math></inline-formula> 100 mV in the tunneling onset voltage is also observed when <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\left(P_r\right)$ </tex-math></inline-formula> is increased from 1 to <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$3 \mu \text{C}$ </tex-math></inline-formula> /cm <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$^{\textbf {2}}$ </tex-math></inline-formula> . A higher value of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\left(P_r\right)$ </tex-math></inline-formula> results in increasing <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$I_{{\textbf {OFF}}}$ </tex-math></inline-formula> due to the onset of BTBT at zero gate bias. A <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\sim 10^{{\textbf {3}}} \times $ </tex-math></inline-formula> increase in <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$I_{{\textbf {OFF}}}$ </tex-math></inline-formula> is noted when <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\left(P_r\right)$ </tex-math></inline-formula> is increased beyond <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$3 \mu \text{C}$ </tex-math></inline-formula> /cm <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$^{\textbf {2}}$ </tex-math></inline-formula> . A change of 40 mV in the saturation voltage was also noted when <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\left(P_s\right)$ </tex-math></inline-formula> is increased from 10 to <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$60 \mu \text{C}$ </tex-math></inline-formula> /cm <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$^{\textbf {2}}$ </tex-math></inline-formula> . We have also observed a significant change in the device’s transconductance ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\left(g_m\right)$ </tex-math></inline-formula> ) and output resistance ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\left(r_o\right)$ </tex-math></inline-formula> ) with the variation in ferroelectricity of the spacer material. The gate capacitances also change with <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\left(P_s\right)$ </tex-math></inline-formula> and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\left(P_r\right)$ </tex-math></inline-formula> and hence the bandwidth.

Topics & Concepts

FerroelectricityQuantum tunnellingNotationMaterials scienceDielectricMathematicsPhysicsElectrical engineeringTopology (electrical circuits)OptoelectronicsCombinatoricsEngineeringArithmeticAdvancements in Semiconductor Devices and Circuit DesignFerroelectric and Negative Capacitance DevicesSemiconductor materials and devices