Ultrathin silicon oxide prepared by in-line plasma-assisted N2O oxidation (PANO) and the application for n-type polysilicon passivated contact

Yuqing Huang, Mingdun Liao, Zhixue Wang, Xueqi Guo, Chun‐Sheng Jiang, Qing Yang, Zhizhong Yuan, Dandan Huang, Jie Yang, Xinyu Zhang, Qi Wang, Hao Jin, Mowafak Al‐Jassim, Chunhui Shou, Yuheng Zeng, Baojie Yan, Jichun Ye