Thermal Decomposition of Anionic, Zwitterionic, and Cationic Polyfluoroalkyl Substances in Aqueous Film-Forming Foams
Feng Xiao, Pavankumar Challa Sasi, Ali Alinezhad, Svetlana A. Golovko, Mikhail Y. Golovko, Anthony Spoto
Abstract
In this study, we investigated thermal decomposition mechanisms of cationic, zwitterionic, and anionic polyfluoroalkyl substances, including those present in aqueous film-forming foam (AFFF) samples. We present novel evidence that polyfluoroalkyl substances gave quantitative yields of perfluoroalkyl substances of different chain lengths during thermal treatment. The results support a radical-mediated transformation mechanism involving random-chain scission and end-chain scission, leading to the formation of perfluoroalkyl carboxylic acids such as perfluorooctanoic acid (PFOA) from certain polyfluoroalkyl amides and sulfonamides. Our results also support a direct thermal decomposition mechanism (chain stripping) on the nonfluorinated moiety of polyfluoroalkyl sulfonamides, resulting in the formation of perfluorooctanesulfonic acid (PFOS) and other structurally related polyfluoroalkyl compounds. Thermal decomposition of 8:2 fluorotelomer sulfonate occurred through end-chain scission and recombination reactions, successively yielding PFOS. All of the studied polyfluoroalkyl substances began to degrade at 200–300 °C, exhibiting near-complete decomposition at ≥400 °C. Using a high-resolution parent ion search method, we demonstrated for the first time that low-temperature thermal treatments of AFFF samples led to the generation of anionic fluoroalkyl substances, including perfluoroheptanesulfonamide, 8:2 fluorotelomer sulfonic acid, N-methyl perfluorooctane sulfonamide, and a previously unreported compound N-2-propenyl-perfluorohexylsulfonamide. This study provides key insights into the fate of polyfluoroalkyl substances in thermal processes.