Machine learning-based run-to-run control of a spatial thermal atomic layer etching reactor
Matthew Tom, Sungil Yun, Henrik Wang, Feiyang Ou, Gerassimos Orkoulas, Panagiotis D. Christofides
Topics & Concepts
SetpointEWMA chartEtching (microfabrication)NanomanufacturingAtomic layer depositionArtificial neural networkLayer (electronics)Materials scienceNanotechnologyComputer scienceProcess (computing)Artificial intelligenceControl chartOperating systemSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignElectronic and Structural Properties of Oxides