<i>In situ</i> thermal preparation of oxide surfaces
Wolfgang Braun, Maren Jäger, Gennadii Laskin, Prosper Ngabonziza, Wolfgang Voesch, Pascal Wittlich, J. Mannhart
Abstract
Substrate surfaces terminated with a specific surface reconstruction are a prerequisite for the controlled epitaxial growth of most materials. Focusing on SrTiO3 (001) substrates, it has recently been shown that in situ substrate termination by thermal annealing has decisive advantages over standard termination methods. We report here that in situ substrate termination is a generally applicable method not restricted to SrTiO3 crystals. We specifically demonstrate the successful surface preparation of doped SrTiO3 (001), LaAlO3 (001), NdGaO3 (001), DyScO3 (110), TbScO3 (110), MgO (001), and Al2O3 (0001) surfaces.
Topics & Concepts
Materials scienceIn situEpitaxyAnnealing (glass)Substrate (aquarium)OxideSurface reconstructionDopingThermalNanotechnologyChemical engineeringComposite materialOptoelectronicsSurface (topology)MetallurgyChemistryGeologyMeteorologyGeometryLayer (electronics)EngineeringOceanographyMathematicsOrganic chemistryPhysicsElectronic and Structural Properties of OxidesMagnetic and transport properties of perovskites and related materialsFerroelectric and Piezoelectric Materials