Plasma information-based virtual metrology (PI-VM) and mass production process control
Seolhye Park, Jaegu Seong, Yunchang Jang, Hyun-Joon Roh, Ji-Won Kwon, Jinyoung Lee, Sangwon Ryu, Jaemin Song, Ki-Baek Roh, Yeongil Noh, Yoona Park, Yongsuk Jang, Taeyoung Cho, Jaeho Yang, Gon‐Ho Kim
Topics & Concepts
MetrologyProcess controlSemiconductor device fabricationPlasmaAutomationComputer scienceAdvanced process controlProcess (computing)Process engineeringMaterials sciencePhysicsNanotechnologyWaferMechanical engineeringEngineeringOpticsQuantum mechanicsOperating systemPlasma Diagnostics and ApplicationsThin-Film Transistor TechnologiesIndustrial Vision Systems and Defect Detection