Fabrication of Plasmonic Indium Tin Oxide Nanoparticles by Means of a Gas Aggregation Cluster Source
Artem Shelemin, Zdeněk Krtouš, Bill Baloukas, O. Zabeida, J.E. Klemberg-Sapieha, L. Martinů
Abstract
High Resolution Image Download MS PowerPoint Slide In this work, we demonstrate, for the first time, the possibility to fabricate indium tin oxide nanoparticles (ITO NPs) using a gas aggregation cluster source. A stable and reproducible deposition rate of ITO NPs has been achieved using magnetron sputtering of an In 2 O 3 /SnO 2 target (90/10 wt %) at an elevated pressure of argon. Remarkably, most of the generated NPs possess a crystalline structure identical to the original target material, which, in combination with their average size of 17 nm, resulted in a localized surface plasmon resonance peak at 1580 nm in the near-infrared region.
Topics & Concepts
Indium tin oxideNanoparticleIndiumPlasmonSputter depositionSurface plasmon resonanceMaterials scienceArgonCluster (spacecraft)SputteringFabricationTinOxideDeposition (geology)NanotechnologyOptoelectronicsChemical engineeringThin filmChemistryMetallurgyBiologyPaleontologyComputer scienceOrganic chemistrySedimentEngineeringProgramming languagePathologyAlternative medicineMedicineZnO doping and propertiesGas Sensing Nanomaterials and SensorsGold and Silver Nanoparticles Synthesis and Applications