New Approaches to EUV Photoresists: Studies of Polyacetals and Polypeptoids to Expand the Photopolymer Toolbox
Jingyuan Deng, Florian Kaefer, Sean Bailey, Yusuke Otsubo, Zoey Meng, Rachel A. Segalman, Christopher K. Ober
Abstract
Low stochastics, high sensitivity photoresists remain a goal for EUV lithography. Here we present studies of two polymer systems that attempt to make improvements to these resist characteristics using two different chemical approaches. In one system we work on scissionable poly(phthalaldehyde) modified to enable incorporation of photoactive units on each repeat unit of the polymer chain. In a second system we explore peptoid polymers that possess identical molecular size and composition with much higher molecular uniformity than possible by conventional synthetic techniques. We report the results of exposure of these materials to EUV exposures and the chemical changes that occur.