Investigation on Material Removal Mechanisms in Photocatalysis-Assisted Chemical Mechanical Polishing of 4H–SiC Wafers
Yan He, Zewei Yuan, Shuyuan Song, Xingjun Gao, Wenjuan Deng
Topics & Concepts
Materials scienceWaferSilicon carbidePolishingChemical-mechanical planarizationAmorphous solidX-ray photoelectron spectroscopyPhotocatalysisLayer (electronics)Composite materialSiliconChemical engineeringNanotechnologyMetallurgyCrystallographyChemistryCatalysisOrganic chemistryEngineeringAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced ceramic materials synthesis