Electron Beam Lithography of Magnetic Skyrmions
Yao Guang, Yong Peng, Z. R. Yan, Yizhou Liu, Junwei Zhang, Xue Zeng, Senfu Zhang, Shilei Zhang, David M. Burn, Nicolas Jaouen, Jinwu Wei, Hongjun Xu, Jiafeng Feng, Chi Fang, G. van der Laan, T. Hesjedal, Baoshan Cui, Xixiang Zhang, Guoqiang Yu, Xiufeng Han
Abstract
The emergence of magnetic skyrmions, topological spin textures, has aroused tremendous interest in studying the rich physics related to their topology. While skyrmions promise high-density and energy-efficient magnetic memory devices for information technology, the manifestation of their nontrivial topology through single skyrmions and ordered and disordered skyrmion lattices could also give rise to many fascinating physical phenomena, such as chiral magnon and skyrmion glass states. Therefore, generating skyrmions at designated locations on a large scale, while controlling the skyrmion patterns, is the key to advancing topological magnetism. Here, a new, yet general, approach to the "printing" of skyrmions with zero-field stability in arbitrary patterns on a massive scale in exchange-biased magnetic multilayers is presented. By exploiting the fact that the antiferromagnetic order can be reconfigured by local thermal excitations, a focused electron beam with a graphic pattern generator to "print" skyrmions is used, which is referred to as skyrmion lithography. This work provides a route to design arbitrary skyrmion patterns, thereby establishing the foundation for further exploration of topological magnetism.