Atomic Layer Deposition of Al-Doped MoS<sub>2</sub>: Synthesizing a p-type 2D Semiconductor with Tunable Carrier Density
Vincent Vandalon, Marcel A. Verheijen, W. M. M. Kessels, Ageeth A. Bol
Abstract
ALD of interest not only for nanoelectronics but also for photovoltaics and transition-metal dichalcogenide-based catalysts.
Topics & Concepts
Atomic layer depositionNanoelectronicsMaterials scienceDopingSemiconductorNanotechnologyFabricationPhotovoltaicsOptoelectronicsElectron mobilityCrystallinityThin filmElectrical engineeringPhotovoltaic systemComposite materialPathologyEngineeringAlternative medicineMedicine2D Materials and ApplicationsMXene and MAX Phase MaterialsFerroelectric and Negative Capacitance Devices