Highly stable performance of flexible Hf<sub>0.6</sub>Zr<sub>0.4</sub>O<sub>2</sub> ferroelectric thin films under multi-service conditions
Wenyan Liu, Jiajia Liao, Jie Jiang, Yichun Zhou, Qiang Chen, Sheng-Tao Mo, Qiong Yang, Qiangxiang Peng, Limei Jiang
Abstract
Flexible HZO ferroelectric films with superior ferroelectricity, retention and fatigue endurance under multiple harsh conditions.
Topics & Concepts
FerroelectricityMaterials scienceThin filmOptoelectronicsNanotechnologyDielectricFerroelectric and Negative Capacitance DevicesFerroelectric and Piezoelectric MaterialsSemiconductor materials and devices