Zn-Ti oxo cluster photoresists for EUV Lithography: Cluster structure and lithographic performance
Daohan Wang, Runfeng Xu, Danhong Zhou, Jun Zhao, Jianhua Zhang, Pengzhong Chen, Xiaojun Peng
Topics & Concepts
Extreme ultraviolet lithographyLithographyCluster (spacecraft)Ligand (biochemistry)Extreme ultravioletMaterials scienceResistMetalX-ray lithographyNanotechnologyChemistryCrystallographyOptoelectronicsOpticsPhysicsMetallurgyComputer scienceLayer (electronics)Programming languageBiochemistryReceptorLaserAdvancements in Photolithography TechniquesElectron and X-Ray Spectroscopy TechniquesX-ray Diffraction in Crystallography