Analysis of plasma etching resistance for commercial quartz glasses used in semiconductor apparatus in fluorocarbon plasma
Jae Ho Choi, JiSob Yoon, YoonSung Jung, Kyung Won Min, Won Bin Im, Hyeong-Jun Kim
Topics & Concepts
QuartzInductively coupled plasmaEtching (microfabrication)ImpuritySurface roughnessMaterials scienceAnalytical Chemistry (journal)PlasmaPlasma etchingSiliconMineralogyChemistryLayer (electronics)Composite materialMetallurgyChromatographyOrganic chemistryQuantum mechanicsPhysicsPlasma Diagnostics and ApplicationsZnO doping and propertiesCopper Interconnects and Reliability