Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile
Jihong Yim, Emma Verkama, Jorge Velasco, Karsten Arts, Riikka L. Puurunen
Abstract
transition flow). The modelling was compared to a recent slope method to extract the sticking coefficient. The slope method gave systematically somewhat higher sticking coefficient values compared to the input sticking coefficient values; the potential reasons behind the observed differences are discussed.
Topics & Concepts
Sticking coefficientAtomic layer depositionDiffusionMicrochannelChemistryThin filmDeposition (geology)Diffusion processInert gasWork (physics)Materials scienceAnalytical Chemistry (journal)ThermodynamicsNanotechnologyComposite materialPhysical chemistryOrganic chemistryDesorptionPaleontologyComputer scienceBiologyKnowledge managementInnovation diffusionSedimentPhysicsAdsorptionSemiconductor materials and devicesElectronic and Structural Properties of OxidesCatalytic Processes in Materials Science