Tungsten disulfide thin films <i>via</i> electrodeposition from a single source precursor
Shibin Thomas, Victoria K. Greenacre, Danielle E. Smith, Yasir J. Noori, Nema M. Abdelazim, Andrew L. Hector, C.H. de Groot, William Levason, Philip N. Bartlett, Gillian Reid
Abstract
[NEt 4 ] 2 [WS 2 Cl 4 ], which incorporates the required 1 : 2 W : S ratio, is an effective single source precursor for the electro-deposition of WS 2 thin films from a CH 2 Cl 2 electrolyte, avoiding the need for a proton source.
Topics & Concepts
TungstenTungsten disulfideElectrolyteThin filmDisulfide bondMaterials scienceChemical engineeringDeposition (geology)Combinatorial chemistryChemistryNanotechnologyInorganic chemistryElectrodePhysical chemistryComposite materialMetallurgySedimentBiologyEngineeringPaleontologyBiochemistry2D Materials and ApplicationsChalcogenide Semiconductor Thin FilmsMXene and MAX Phase Materials