Litcius/Paper detail

Origin and quantification of the ultimate carrier concentration limits in <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mrow><mml:msub><mml:mi>In</mml:mi><mml:mn>2</mml:mn></mml:msub><mml:msub><mml:mi mathvariant="normal">O</mml:mi><mml:mn>3</mml:mn></mml:msub></mml:mrow></mml:math> and Sn-doped <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mrow><mml:msub><mml:mi>In</mml:mi><mml:mn>2</mml:mn></mml:msub><mml:msub><mml:mi mathvariant="normal">O</mml:mi><mml:mn>3</mml:mn></mml:msub></mml:mrow></mml:math>

Andreas Klein, Alexander Frebel, Kim Alexander Creutz, Binxiang Huang

2024Physical Review Materials11 citationsDOI

Abstract

The ultimate limits of the carrier concentrations in ${\mathrm{In}}_{2}{\mathrm{O}}_{3}$ and Sn-doped ${\mathrm{In}}_{2}{\mathrm{O}}_{3}$ are derived from operando photoelectron spectroscopy of a solid oxide electrochemical cell with Y-doped ${\mathrm{ZrO}}_{2}$ as the oxygen electrolyte. It is demonstrated that the limits are determined by the transition of the oxygen vacancy to the neutral state and to the reduction of ${\mathrm{Sn}}^{4+}$ donors to ${\mathrm{Sn}}^{2+}$ electron traps, respectively. Maximum Fermi energies of 3.85 and $3.35\phantom{\rule{0.16em}{0ex}}\mathrm{eV}$ above the valence band maximum are identified for ITO and ${\mathrm{In}}_{2}{\mathrm{O}}_{3}$. The ultimate carrier concentrations achievable by Sn doping and by oxygen vacancies are estimated to be $1.8--1.9\ifmmode\times\else\texttimes\fi{}{10}^{21}\phantom{\rule{0.16em}{0ex}}{\mathrm{cm}}^{\ensuremath{-}3}$ and $6--7\ifmmode\times\else\texttimes\fi{}{10}^{20}\phantom{\rule{0.16em}{0ex}}{\mathrm{cm}}^{\ensuremath{-}3}$.

Topics & Concepts

Materials scienceOxygenDopingValence (chemistry)X-ray photoelectron spectroscopyAnalytical Chemistry (journal)Fermi levelPhysicsAtomic physicsCrystallographyCondensed matter physicsElectronNuclear magnetic resonanceChemistryNuclear physicsQuantum mechanicsChromatographyZnO doping and propertiesGas Sensing Nanomaterials and SensorsElectronic and Structural Properties of Oxides
Origin and quantification of the ultimate carrier concentration limits in <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mrow><mml:msub><mml:mi>In</mml:mi><mml:mn>2</mml:mn></mml:msub><mml:msub><mml:mi mathvariant="normal">O</mml:mi><mml:mn>3</mml:mn></mml:msub></mml:mrow></mml:math> and Sn-doped <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mrow><mml:msub><mml:mi>In</mml:mi><mml:mn>2</mml:mn></mml:msub><mml:msub><mml:mi mathvariant="normal">O</mml:mi><mml:mn>3</mml:mn></mml:msub></mml:mrow></mml:math> | Litcius