Photolithography Fabricated Sub-Decibel High-Efficiency Silicon Waveguide Grating Coupler
Xuetong Zhou, Hon Ki Tsang
Abstract
Using the optimized shift-pattern overlay method, we present a new high-efficiency silicon waveguide grating coupler operating at 1550 nm center wavelength, which has a simulation predicted coupling loss of 0.68 dB and experimentally measured loss of 0.89 dB. This record result was achieved without any substrate bottom mirrors or use of electron beam lithography and was fabricated with the standard processes of a multi-project wafer fabrication service from a commercial foundry.
Topics & Concepts
Materials scienceGratingPhotolithographyWaveguideOptoelectronicsOpticsElectron-beam lithographyWaferFabricationInsertion lossLithographyCoupling lossResistNanotechnologyOptical fiberLayer (electronics)PhysicsPathologyMedicineAlternative medicinePhotonic and Optical DevicesAdvanced Fiber Optic SensorsOptical Coatings and Gratings