A general strategy for polishing SiC wafers to atomic smoothness with arbitrary facets
Peixuan Ji, Kaimin Zhang, Zhenzhen Zhang, Mei Zhao, Rui Li, Danni Hao, Ramiro Moro, Yanqing Ma, Lei Ma
Topics & Concepts
PolishingMaterials scienceWaferFacet (psychology)GrindingChemical-mechanical planarizationSurface finishSurface roughnessGrapheneNanotechnologyMechanical engineeringEngineering physicsComposite materialEngineeringPsychologyPersonalitySocial psychologyBig Five personality traitsAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchSemiconductor materials and devices