Sub-micron moulding topological mass transport regimes in angled vortex fluidic flow
Thaar M. D. Alharbi, Matt Jellicoe, Xuan Luo, Kasturi Vimalanathan, Ibrahim K. Alsulami, Bediea S. AL Harbi, Aghil Igder, Fayed Abdullah Alrashaidi, Xianjue Chen, Keith A. Stubbs, Justin M. Chalker, Wei Zhang, Ramiz A. Boulos, D. B. Jones, Jamie S. Quinton, Colin L. Raston
Abstract
. In addition, these flow patterns have unique signatures that enable the morphology of nanomaterials processed in the VFD to be predicted, for example in reversible scrolling and crumbling graphene oxide sheets. Shear-stress induced recrystallisation, crystallisation and polymerisation, at different rotational speeds, provide moulds of high-shear topologies, as 'positive' and 'negative' spicular flow behaviour. 'Molecular drilling' of holes in a thin film of polysulfone demonstrate spatial arrangement of double-helices. The grand sum of the different behavioural regimes is a general fluid flow model that accounts for all processing in the VFD at an optimal tilt angle of 45°, and provides a new concept in the fabrication of novel nanomaterials and controlling the organisation of matter.