Litcius/Paper detail

RF Power Performance of Sc(Al,Ga)N/GaN HEMTs at Ka-Band

Andrew J. Green, Neil Moser, Nicholas C. Miller, Kyle J. Liddy, Miles Lindquist, Michael Elliot, J. Gillespie, Robert Fitch, Ryan Gilbert, Dennis E. Walker, Elizabeth Werner, Antonio Crespo, Edward Beam, Andy Xie, Cathy Lee, Yu Cao, Kelson D. Chabak

2020IEEE Electron Device Letters82 citationsDOIOpen Access PDF

Abstract

We report the RF power results of Sc(Al,Ga)N/GaN high electron mobility transistors (HEMTs). We show dc, small-signal RF and load-pull performance at 30 GHz with two barrier alloys-a ternary of ScAlN and a quaternary of ScAlGaN. The active layers are grown by molecular beam epitaxy on a GaN-on-SiC template. The Sc(Al,Ga)N HEMTs with 120 nm gate length achieve transconductance >700 mS/mm and >70 GHz cutoff frequency. The quaternary ScAlGaN sample shows reduced current collapse during pulsed I-V and load-pull characterization. The ScAlGaN HEMT delivers 5.77 W/mm output power (VD = 20 V) and 47% power-added efficiency (VD = 15 V) when tuned for maximum power and efficiency, respectively.

Topics & Concepts

TransconductanceMaterials scienceHigh-electron-mobility transistorOptoelectronicsMolecular beam epitaxyCutoff frequencyLoad pullTransistorRadio frequencyRF power amplifierTernary operationGallium nitrideWide-bandgap semiconductorPower-added efficiencyElectrical engineeringEpitaxyAmplifierLayer (electronics)VoltageNanotechnologyCMOSEngineeringComputer scienceProgramming languageGaN-based semiconductor devices and materialsAcoustic Wave Resonator TechnologiesMetal and Thin Film Mechanics