Enhanced activation of Mg ion-implanted GaN at decreasing annealing temperature by prolonging duration
Takuya Nakashima, Emi Kano, Keita Kataoka, Shigeo Arai, Hideki Sakurai, Tetsuo Narita, Kacper Sierakowski, Michał Boćkowski, Masahiro Nagao, Jun Suda, Tetsu Kachi, Nobuyuki Ikarashi
Abstract
Abstract Defect time-evolution was investigated in Mg ion-implanted GaN after annealing at 1573 K for an unprecedentedly long duration. Transmission electron microscopy directly revealed that annealing for over 30 min reduced defects inhibiting Mg activation, just like annealing at 1753 K for a short duration. The cathodoluminescence intensity of donor–acceptor pair originating from Mg acceptors increased as the duration increased, and the intensity after annealing for 60 min was higher than after short-duration annealing at 1753 K. These show the potential of lowering the annealing temperature by prolonging the duration, which would lead to practical annealing technology for Mg ion-implanted GaN.