Graphitic Carbon Nitride Films: Emerging Paradigm for Versatile Applications
Changchao Jia, Lijun Yang, Yizhu Zhang, Xia Zhang, Kai Xiao, Jingsan Xu, Jian Liu
Abstract
Graphitic carbon nitride (g-C3N4) is a well-known two-dimensional conjugated polymer semiconductor that has been broadly applied in photocatalysis-related fields. However, further developments of g-C3N4, especially in device applications, have been constrained by the inherent limitations of its insoluble nature and particulate properties. Recent breakthroughs in fabrication methods of g-C3N4 films have led to innovative and inspiring applications in many fields. In this review, we first summarize the fabrication of continuous and thin films, either supported on substrates or as free-standing membranes. Then, the novel properties and application of g-C3N4 films are the focus of the current review. Finally, some underlying challenges and the future developments of g-C3N4 films are tentatively discussed. This review is expected to provide a comprehensive and timely summary of g-C3N4 film research to the wide audience in the field of conjugated polymer semiconductor-based materials.