Enhancing ceria slurry performance for shallow trench isolation chemical mechanical polishing through non-ionic surfactant addition
Lifei Zhang, Lile Xie, Xinchun Lu
Topics & Concepts
Chemical-mechanical planarizationSlurryMaterials scienceChemical engineeringPolishingPulmonary surfactantZeta potentialShallow trench isolationAdsorptionWaferPolyethylene glycolIonic bondingNanotechnologyComposite materialNanoparticleChemistryOrganic chemistryLayer (electronics)IonTrenchEngineeringAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchMetal Extraction and Bioleaching