Litcius/Paper detail

The mechanism of ceria slurry on chemical mechanical polishing efficiency and surface quality of Gallium nitride

Wenhao Xian, Baoguo Zhang, Shitong Liu, Yijun Wang, Sihui Qin, Yang Liu

2024Materials Science in Semiconductor Processing11 citationsDOI

Topics & Concepts

Materials sciencePolishingSlurryChemical-mechanical planarizationNitrideMetallurgyMechanism (biology)Gallium nitrideQuality (philosophy)GalliumComposite materialLayer (electronics)PhilosophyEpistemologyAdvanced ceramic materials synthesisMetal and Thin Film MechanicsSemiconductor materials and devices
The mechanism of ceria slurry on chemical mechanical polishing efficiency and surface quality of Gallium nitride | Litcius