Litcius/Paper detail

Enhanced electrical stability and reliability of amorphous IGZO/HfO2 thin film transistors with CF4 plasma treatment

Gyulee Kim, Sunbum Kim, Minhyuk Kim, Changhwan Choi

2025Applied Surface Science12 citationsDOI

Topics & Concepts

Reliability (semiconductor)Amorphous solidMaterials scienceThin-film transistorPlasmaTransistorOptoelectronicsEngineering physicsThin filmStability (learning theory)NanotechnologyElectrical engineeringComputer scienceChemistryEngineeringCrystallographyPhysicsPower (physics)ThermodynamicsLayer (electronics)Quantum mechanicsVoltageMachine learningThin-Film Transistor TechnologiesElectrical and Thermal Properties of MaterialsSemiconductor materials and devices
Enhanced electrical stability and reliability of amorphous IGZO/HfO2 thin film transistors with CF4 plasma treatment | Litcius