First-principles insights into the synergistic chemical–mechanical removal mechanism of 4H-SiC in chemical mechanical polishing
Changqi Xu, Xin Song, Li Ning, Yan Su, Renke Kang, Shang Gao
Topics & Concepts
Mechanism (biology)Chemical-mechanical planarizationPolishingMaterials scienceNanotechnologyChemistryChemical engineeringMetallurgyEngineeringPhysicsQuantum mechanicsSilicon Carbide Semiconductor TechnologiesAdvanced Surface Polishing TechniquesAdvanced ceramic materials synthesis