Effects of High-Pressure Annealing on the Low-Frequency Noise Characteristics in Ferroelectric FET
Wonjun Shin, Jong‐Ho Bae, Sihyun Kim, Kitae Lee, Dongseok Kwon, Byung‐Gook Park, Daewoong Kwon, Jong‐Ho Lee
Abstract
In this work, the low-frequency noise (LFN) characteristics of hafnium-zirconium oxide (HZO) ferroelectric field-effect transistors (FeFETs) with and without high-pressure forming gas annealing (HPA) treatment are investigated. The origin of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1/ {f}$ </tex-math></inline-formula> noise in the FeFET without HPA is changed from carrier number fluctuation to Hooge’s mobility fluctuation after wake-up due to the remote phonon scattering from the polarized HZO. Also, Hooge’s parameter is increased by the program/erase (P/E) cycling-induced stress. On the contrary, only the correlated mobility fluctuation is increased after the wake-up in the FeFET with HPA. Furthermore, the LFN of the FeFET with HPA shows robustness to P/E cycling-induced stress after the wake-up, showing superb endurance performance.