Comparison of passivation properties of plasma-assisted ALD and APCVD deposited Al2O3 with SiNx capping
Keeya Madani, A. Rohatgi, Kwan Hong Min, Hee‐eun Song, Ying-Yuan Huang, Ajay Upadhyaya, Vijaykumar Upadhyaya, Brian Rounsaville, Young‐Woo Ok
Topics & Concepts
PassivationAtomic layer depositionCommon emitterMaterials scienceWaferSiliconBoronSaturation currentOptoelectronicsChemical vapor depositionSolar cellFabricationAnalytical Chemistry (journal)NanotechnologyLayer (electronics)ChemistryAlternative medicineQuantum mechanicsPhysicsMedicineOrganic chemistryPathologyChromatographyVoltageSilicon and Solar Cell TechnologiesSilicon Nanostructures and PhotoluminescenceSemiconductor materials and interfaces